2008
Nanoimprint lithography for nanophotonics in silicon
Publication
Publication
Nano Lett. , Volume 8 p. 2872- 2877
A novel inverse imprinting procedure for nanolithography is presented which offers a transfer accuracy and feature definition that is comparable to state-of-the-art nanofabrication techniques. We illustrate the fabrication quality of a demanding nanophotonic structure: a photonic crystal waveguide. Local examination using photon scanning tunneling microscopy (PSTM) shows that the resulting nanophotonic structures have excellent guiding properties at wavelengths in the telecommunications range, which indicates a high quality of the local structure and the overall periodicity.
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| doi.org/10.1021/nl801615c | |
| Nano Lett. | |
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Bruinink, C. M., Burresi, M., Segerink, F. B., Jansen, H. V., de Boer, M., Berenschot, E., … Kuipers, K. (2008). Nanoimprint lithography for nanophotonics in silicon. Nano Lett., 8, 2872–2877. doi:10.1021/nl801615c |
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