1996
Low energy ion beam mixing as a tool for multilayer x-ray mirror fabrication
Publication
Publication
Appl. Phys. Lett. , Volume 68 p. 2948- 2950
We present low energy ion beam mixing as a tool for the fabrication of composite layers with smooth interfaces. Using this tool we make a stack of alternating layers of Si and MoxSiy. We measure composition and interfacial roughness (s) and find x/yª and sª4 Å. The method can be applied to reduce absorption losses in x-ray multilayer mirrors for high-resolution dispersive purposes, and to increase thermal stability of multilayers. The thickness of the mixed layers is found
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Appl. Phys. Lett. | |
Schlatmann, R., Keppel, A., Bultman, S., Weber, T., & Verhoeven, J. (1996). Low energy ion beam mixing as a tool for multilayer x-ray mirror fabrication. Appl. Phys. Lett., 68, 2948–2950. |