1994
Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment
Publication
Publication
Microelectron. Eng. , Volume 23 p. 215- 218
In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for l=13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.
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| Microelectron. Eng. | |
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Louis, E., Voorma, H.-J., Koster, N. B., Shmaenok, L., Bijkerk, F., Schlatmann, R., … Padmore, H. A. (1994). Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment. Microelectron. Eng., 23, 215–218. |
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