A novel process to form epitaxial Si structures with buried silicide

1992

Additional Metadata
Publisher	Materials Research Society
Editor	G.S. Was , L.E. Rehn , D.M. Follstaedt
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Erokhin, Y. N., Grotzschel, R., Oktyabrsky, S. R., Roorda, S., Sinke, W., & Vjatkin, A. F. (1992). A novel process to form epitaxial Si structures with buried silicide. In G. S. Was, L. E. Rehn, & D. M. Follstaedt (Eds.), Phase Formation and Modification by Beam-Solid Interactions : Symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A. (pp. 313–318).

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