Secondary defect reduction by channeling implantation of B and P in &lt;100&gt; silicon

1991

Secondary defect reduction by channeling implantation of B and P in <100> silicon

Additional Metadata
Journal	Nucl. Instrum. Methods Phys. Res. B
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Raineri, V., Schreutelkamp, R., Saris, F. W., Kaim, R. E., & Janssen, K. T. F. (1991). Secondary defect reduction by channeling implantation of B and P in <100> silicon. Nucl. Instrum. Methods Phys. Res., Sect B, 59/60, 1056–1060.