Avoiding preamorphization damage in MeV heavy ion-implanted silicon

1991

Appl. Phys. Lett. , Volume 58 p. 2827- 2829

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Journal	Appl. Phys. Lett.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Schreutelkamp, R., Custer, J. S., Liefting, J. R., & Saris, F. W. (1991). Avoiding preamorphization damage in MeV heavy ion-implanted silicon. Appl. Phys. Lett., 58, 2827–2829.

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