Avoiding transient diffusion of boron in Si(100)

1990

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Publisher	Materials Research Society
Editor	J.A. Knapp , P. Borgesen , R.A. Zuhr
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Schreutelkamp, R., Lu, W. X., Saris, F. W., Janssen, K. T. F., Ottenheim, J. J. M., Kaim, R. E., & Westendorp, J. F. M. (1990). Avoiding transient diffusion of boron in Si(100). In J. A. Knapp, P. Borgesen, & R. A. Zuhr (Eds.), Beam-Solid Interactions : Physical Phenomena : Symposium held November 27-December 1, 1989, Boston, Massachusetts, U.S.A. (pp. 691–696).

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