Influence of layer thickness on nucleation in amorphous silicon thin films

1990

Mater. Lett. , Volume 9 p. 259- 262

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Journal	Mater. Lett.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Roorda, S., Kamman, D., Sinke, W., van de Walle, G. F. A., & van Gorkum, A. A. (1990). Influence of layer thickness on nucleation in amorphous silicon thin films. Mater. Lett., 9, 259–262.

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