Low temperature epitaxial NiSi2 formation on Si(111) by diffusing Ni through amorphous Ni-Zr

1990

J. Mater. Res. , Volume 5 p. 341- 346

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Journal	J. Mater. Res.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	de Reus, R., Tissink, H. C., & Saris, F. W. (1990). Low temperature epitaxial NiSi2 formation on Si(111) by diffusing Ni through amorphous Ni-Zr. J. Mater. Res., 5, 341–346.

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