Ion-assisted etching of Si and SiO2 by halogens

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Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	de Vries, A. E. (1989). Ion-assisted etching of Si and SiO2 by halogens. In 1989 15th Annual Plasma Seminar Proceedings (pp. 37–44).

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