Structural relaxation of amorphous silicon induced by nanosecond pulsed-laser irradiation

1987

Additional Metadata
Publisher	Editions de Physique
Editor	A. Golanski , V.T. Nguyen , E.F. Krimmel
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Sinke, W., Warabisako, T., Miyao, M., Moniwa, M., Tokuyama, T., Roorda, S., & Saris, F. W. (1987). Structural relaxation of amorphous silicon induced by nanosecond pulsed-laser irradiation. In A. Golanski, V. T. Nguyen, & E. F. Krimmel (Eds.), Photon, Beam, and Plasma Enhanced Processing : June 2nd-5th, 1987, Strasbourg, (France) (pp. 279–284).

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