A magnetron reactor for high flux reactive ion etching

Additional Metadata
Publisher	A. Hilger
Editor	W.T. Williams
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Kuypers, A. D., & Hopman, H. J. (1987). A magnetron reactor for high flux reactive ion etching. In W. T. Williams (Ed.), XVIII International Conference on Phenomena in Ionized Gases, Swansea, 13th-17th July 1987 : Contributed Papers (pp. 800–801).

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