Influence of highly charged impurities on ion temperatures measured with active-beam plasma diagnostics

1987

J. Appl. Phys. , Volume 62 p. 780- 786

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Journal	J. Appl. Phys.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Donn, A. J. H., & de Heer, F. J. (1987). Influence of highly charged impurities on ion temperatures measured with active-beam plasma diagnostics. J. Appl. Phys., 62, 780–786.

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