Laser-induced etching of Si with chlorine

1986

J. Appl. Phys. , Volume 60 p. 2321- 2326

Additional Metadata
Journal	J. Appl. Phys.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Baller, T. S., Oostra, D. J., de Vries, A. E., & van Veen, G. N. A. (1986). Laser-induced etching of Si with chlorine. J. Appl. Phys., 60, 2321–2326.

Publication