Electron and ion beam activated solid phase epitaxy of ion-implanted silicon

1985

Additional Metadata
Publisher	Editions de Physique
Editor	V.T. Nguyen , A.G. Cullis
Organisation	Photonic Materials
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Miyao, M., Polman, A., van Kemp, R., Westendorp, J. F. M., Sinke, W., van der Veen, J. F., & Saris, F. W. (1985). Electron and ion beam activated solid phase epitaxy of ion-implanted silicon. In V. T. Nguyen & A. G. Cullis (Eds.), Energy Beam-Solid Interactions and Transient Thermal Processing, 1985, IV : May 13th - 15th 1985, Strasbourg (France) (pp. 181–185).

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