High-temperature SiO2 decomposition at the SiO2/Si interface

1985

Phys. Rev. Lett. , Volume 55 p. 2332- 2335

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Journal	Phys. Rev. Lett.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Tromp, R. M., Rubloff, G. W., Balk, P., LeGoues, F. K., & van Loenen, E. J. (1985). High-temperature SiO2 decomposition at the SiO2/Si interface. Phys.Rev.Lett., 55, 2332–2335.

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