Studies on the mechanism of chemical sputtering of silicon by simultaneous exposure to Cl2 and low-energy Ar+ ions

1985

J. Vac. Sci. Technol. B , Volume 3 p. 1384- 1392

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Journal	J. Vac. Sci. Technol. B
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Dieleman, J., Sanders, F. H. M., Kolfschoten, A. W., Zalm, P. C., de Vries, A. E., & Haring, R. A. (1985). Studies on the mechanism of chemical sputtering of silicon by simultaneous exposure to Cl2 and low-energy Ar+ ions. J. Vac. Sci. Technol. B, 3, 1384–1392.

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