Residual damage to an atomically cleaned low-temperature-annealed Si (100) surface

1980

Appl. Phys. Lett. , Volume 37 p. 563- 565

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Journal	Appl. Phys. Lett.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Yamada, I., Marton, D., & Saris, F. W. (1980). Residual damage to an atomically cleaned low-temperature-annealed Si (100) surface. Appl. Phys. Lett., 37, 563–565.

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