Nonthermal pulsed laser annealing of Si; plasma annealing

1979

Phys. Lett. A , Volume 74 p. 422- 426

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Journal	Phys. Lett. A
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	van Vechten, J. A., Tsu, R., & Saris, F. W. (1979). Nonthermal pulsed laser annealing of Si; plasma annealing. Phys. Lett. A, 74, 422–426.

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