Sputtering and surface topography of monocrystalline copper in the temperature range 50-600 K

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Degree Grantor	University of Amsterdam UvA
Promotor	J. Kistemaker
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Elich, J. J. P. (1972, October 4). Sputtering and surface topography of monocrystalline copper in the temperature range 50-600 K.

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